About this scholarly article

2015 15th International Workshop on Junction Technology (IWJT) - P, Sb and Sn ion implantation with laser melt-LPC (liquid phase crystallization) for high activation n+ ultra shallow junction in Ge epilayer and surface strain-Ge formation for mobility enhancement by Borland, John; Herman, Joshua; Novak, Steve; Onoda, Hiroshi; Nakashima, Yoshiki; Huet, Karim; Johnson, Walt; Joshi, Abhijeet is a scholarly article available to read on EtoBox.

Author

Borland, John; Herman, Joshua; Novak, Steve; Onoda, Hiroshi; Nakashima, Yoshiki; Huet, Karim; Johnson, Walt; Joshi, Abhijeet

Publisher

IEEE

Published

2015

Language

EN