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This document investigates the performance limits of laterally diffused metal-oxide-semiconductor (LDMOS) transistors using three field oxide structures: LOCOS, step gate (SG), and shallow trench isolation (STI). A novel optimization algorithm is employed to evaluate the breakdown voltage and specific resistance, revealing that LOCOS outperforms the other structures in terms of power density figure-of-merit (FOM). The findings provide valuable insights for optimizing LDMOS technologies within the 30-50 V ra

Author
mohityadav1sep
Language
EN

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