Opening book details…
About this Engineering article
Increasing Plasma Etch Resistance of Resists Using Fullerene Additives by P. M. Dentinger is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P. M. Dentinger
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1997
- Language
- EN
- Field
- Engineering (Physical Sciences)