About this scholarly article

Asia Communications and Photonics Conference and Exhibition - A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma by Fang, Rong; Guo, Xia; Jiang, Wen Jing; Guo, Yu Han; Qin, Yuan; Di Shen, Guang; Han, Jin Ru is a scholarly article available to read on EtoBox.

Author

Fang, Rong; Guo, Xia; Jiang, Wen Jing; Guo, Yu Han; Qin, Yuan; Di Shen, Guang; Han, Jin Ru

Publisher

OSA

Published

2009

Language

EN