About this scholarly article

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Wafer level CD metrology on photomasks using aerial imaging technology by Scherübl, Thomas; Horiuchi, Toshiyuki; Strößner, Ulrich; Seitz, Holger; Birkner, Robert; Richter, Rigo is a scholarly article available to read on EtoBox.

Author

Scherübl, Thomas; Horiuchi, Toshiyuki; Strößner, Ulrich; Seitz, Holger; Birkner, Robert; Richter, Rigo

Publisher

SPIE

Published

2008

Language

EN