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About this Materials Science article
Materials chemistry communications. Difluorosilylene as a precursor for the chemical vapour deposition of titanium silicide by Chen, C. C.; Yu, J. L.; Lee, C. Y.; Liu, C. S.; Chiu, H. T. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Chen, C. C.; Yu, J. L.; Lee, C. Y.; Liu, C. S.; Chiu, H. T.
- Publisher
- Royal Society of Chemistry; The Royal Society of Chemistry; Royal Society of Chemistry (RSC) (ISSN 0959-9428)
- Published
- 1992
- Language
- EN
- Field
- Materials Science (Physical Sciences)
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