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About this scholarly article
10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295) - Dual frequency silicon nitride film of low thermal budget for pre-metal dielectric applications in sub-0.25 μm devices by Yuxiang Wang, ; Lee, J.H.; Thakur, B.; Huang, J. is a scholarly article available to read on EtoBox.
- Author
- Yuxiang Wang, ; Lee, J.H.; Thakur, B.; Huang, J.
- Publisher
- IEEE
- Published
- 1999
- Language
- EN
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