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About this Engineering article

Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage by Lee, B. S. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Lee, B. S.
Publisher
The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
Published
1990
Language
EN
Field
Engineering (Physical Sciences)

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