About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Using OPC to optimize for image slope and improve process window by Cobb, Nicolas B.; Granik, Yuri; Tanabe, Hiroyoshi is a scholarly article available to read on EtoBox.

Author

Cobb, Nicolas B.; Granik, Yuri; Tanabe, Hiroyoshi

Publisher

SPIE

Published

2003