About this scholarly article

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Rigorous electromagnetic analysis of aerial image formation in photoresist by Babin, Sergey V.; Sheridan, John T.; Fuller, Gene E. is a scholarly article available to read on EtoBox.

Author

Babin, Sergey V.; Sheridan, John T.; Fuller, Gene E.

Publisher

SPIE

Published

1996

Language

EN