About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Cycloolefin copolymer containing hindered hydroxyl group for 193nm photoresist by Cho, Seung Duk; Sturtevant, John L.; Joo, Hyun Sang; Seo, Dong Chul; Song, Ji Young; Kim, Kyoung Mun; Park, Joo Hyeon; Jung, Jae Chang; Lee, Sung Koo; Bok, Cheol Kyu; Moon, Seung Chan is a scholarly article available to read on EtoBox.

Author

Cho, Seung Duk; Sturtevant, John L.; Joo, Hyun Sang; Seo, Dong Chul; Song, Ji Young; Kim, Kyoung Mun; Park, Joo Hyeon; Jung, Jae Chang; Lee, Sung Koo; Bok, Cheol Kyu; Moon, Seung Chan

Publisher

SPIE

Published

2005

Language

EN