About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus by Barnes, Bryan M.; Goasmat, Francois; Sohn, Martin Y.; Zhou, Hui; Silver, Richard M.; Arceo, Abraham; Starikov, Alexander; Cain, Jason P. is a scholarly article available to read on EtoBox.

Author

Barnes, Bryan M.; Goasmat, Francois; Sohn, Martin Y.; Zhou, Hui; Silver, Richard M.; Arceo, Abraham; Starikov, Alexander; Cain, Jason P.

Publisher

SPIE

Published

2013