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About this Engineering article
Optimization of the geometry of a charge plasma double-gate junctionless transistor for improved RF stability by Pon, Adhithan; Bhattacharyya, Arkaprava; Padmanaban, B.; Ramesh, R. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Pon, Adhithan; Bhattacharyya, Arkaprava; Padmanaban, B.; Ramesh, R.
- Publisher
- Springer; Springer-Verlag; Kluwer Academic Publishers; Springer Science and Business Media LLC (ISSN 1569-8025)
- Published
- 2019
- Field
- Engineering (Physical Sciences)
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