About this scholarly article

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Critical dimension issues for 200 mm electron projection masks by Resnick, D.J.; Nordquist, K.; Dauksher, W.J.; Ainley, E.; Lu, B.; Mangat, P.; Weisbrod, E.; Martin, C.; Wei, A.; Englestad, R.; Lovell, E.; Ivin, V. is a scholarly article available to read on EtoBox.

Author

Resnick, D.J.; Nordquist, K.; Dauksher, W.J.; Ainley, E.; Lu, B.; Mangat, P.; Weisbrod, E.; Martin, C.; Wei, A.; Englestad, R.; Lovell, E.; Ivin, V.

Publisher

Japan Soc. Appl. Phys

Published

2000