About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology by Cain, Jason P.; Sanchez, Martha I.; Takamasu, Kiyoshi; Okitou, Haruki; Takahashi, Satoru; Inoue, Osamu; Kawada, Hiroki; Kamineni, Vimal; Paul, Abhijeet; Bello, A. F. is a scholarly article available to read on EtoBox.

Author

Cain, Jason P.; Sanchez, Martha I.; Takamasu, Kiyoshi; Okitou, Haruki; Takahashi, Satoru; Inoue, Osamu; Kawada, Hiroki; Kamineni, Vimal; Paul, Abhijeet; Bello, A. F.

Publisher

SPIE

Published

2014

Language

EN