About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - A frequency multiplication technique based on EUV near-field imaging by Resnick, Douglas J.; Bencher, Christopher; Chen, Yijian; Shroff, Yashesh is a scholarly article available to read on EtoBox.

Author

Resnick, Douglas J.; Bencher, Christopher; Chen, Yijian; Shroff, Yashesh

Publisher

SPIE

Published

2014