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A New Type of Low-κ Dielectric Films Based on Polysilsesquioxanes by R.Q. Su; T.E. Müller; J. Procházka; J.A. Lercher is a Engineering article available to read on EtoBox.
What is A New Type of Low-κ Dielectric Films Based on Polysilsesquioxanes about?
In conclusion, we assembled three-dimensional structures of colloidal particles on a water surface rather than on a planar substrate. The ordered structure was obtained by evaporating the solvent at elevated temperature, and the resulting crystal was transferred onto a planar substrate by simple sedimentation. Importantly, our method can be used to assemble colloidal particles three-dimensionally irrespective of the size of the colloidal particles. Therefore, when a generated colloidal opal structure is infiltrated by semi-conducting materials with large refractive indices and then templated, [6c,10] our method can be used for all-optical integrated circuits, optical filters, and sensors. ## Experimental Preparation of PS Colloidal Particles: a) 240 nm PS Colloid: PS sub-micrometer-sized particles as building blocks of a photonic crystal were synthesized by emulsifier-free emulsion polymerization. Deionized water (450 g) was poured into a reactor, kept at 80 C, and stirred at 350 rpm. Sodium styrene sulfonate (0.3 g) as emulsifier and sodium hydrogen carbonate (0.25 g) as buffer were added to the water. After 10 min, styrene monomer (50 g) was added to this solution. After 1 h, pot
Who reads A New Type of Low-κ Dielectric Films Based on Polysilsesquioxanes?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- R.Q. Su; T.E. Müller; J. Procházka; J.A. Lercher
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); Wiley-Blackwell; Wiley; Research Square (ISSN 0935-9648)
- Published
- 2002
- Language
- EN
- Field
- Engineering (Physical Sciences)
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