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About this Engineering article
Effects of SF6 plasma treatment on electrical characteristics of TaN-Al2O3-InP metal-oxide-semiconductor field-effect transistor by Wang, Yanzhen; Chen, Yen-Ting; Xue, Fei; Zhou, Fei; Lee, Jack C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Wang, Yanzhen; Chen, Yen-Ting; Xue, Fei; Zhou, Fei; Lee, Jack C.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2012
- Field
- Engineering (Physical Sciences)
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