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About this Engineering article
XPS investigation of polymer residues in reactive ion etching of SiO2 over poly-silicon by W. Pamler; F. Bell; L. Mühlhoff; H.J. Barth is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- W. Pamler; F. Bell; L. Mühlhoff; H.J. Barth
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0921-5093)
- Published
- 1991
- Language
- EN
- Field
- Engineering (Physical Sciences)
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