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About this Materials Science article
Optimisation of nanooxide mask fabricated by atomic force microscopy nanolithography: A response surface methodology application by Rouhi, J.; Mahmud, S.; Hutagalung, S.D.; Kakooei, S. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Rouhi, J.; Mahmud, S.; Hutagalung, S.D.; Kakooei, S.
- Publisher
- The Institution of Engineering and Technology; Institution of Electrical Engineers; Institution of Engineering and Technology; Institution of Engineering and Technology (IET) (ISSN 1750-0443)
- Published
- 2012
- Field
- Materials Science (Physical Sciences)
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