About this scholarly article

2003 8th International Symposium Plasma- and Process-Induced Damage. - Reduction of plasma-radiation-induced interface states for plasma processes of charge-coupled-device image sensors using pulse-time-modulated plasma by Okigawa, N.; Ishikawa, Y.; Samukawa, S. is a scholarly article available to read on EtoBox.

Author

Okigawa, N.; Ishikawa, Y.; Samukawa, S.

Publisher

IEEE

Published

2003

Language

EN