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About this Materials Science article
Substrate Tolerant Direct Block Copolymer Nanolithography by Li, Tao; Wang, Zhongli; Schulte, Lars; Ndoni, Sokol is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Li, Tao; Wang, Zhongli; Schulte, Lars; Ndoni, Sokol
- Publisher
- The Royal Society of Chemistry; Royal Society of Chemistry; Royal Society of Chemistry (RSC) (ISSN 2040-3364)
- Published
- 2016
- Language
- EN
- Field
- Materials Science (Physical Sciences)
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