About this scholarly article

2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials by Samudrala, Pavan; Hart, Gregory; Chen, Yen-Jen; Subramany, Lokesh; Gao, Haiyong; Aung, Nyan; Chung, Woong Jae; Minghetti, Blandine; Mali, Rajan; Khikhlovskyi, Seva; Heres, Pieter is a scholarly article available to read on EtoBox.

Author

Samudrala, Pavan; Hart, Gregory; Chen, Yen-Jen; Subramany, Lokesh; Gao, Haiyong; Aung, Nyan; Chung, Woong Jae; Minghetti, Blandine; Mali, Rajan; Khikhlovskyi, Seva; Heres, Pieter

Publisher

IEEE

Published

2018

Language

EN