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About this Engineering article
Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length by J. Shin; Y. Ma; F. Cerrina is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. Shin; Y. Ma; F. Cerrina
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 2002
- Field
- Engineering (Physical Sciences)