About this scholarly article

2006 International Electron Devices Meeting - Analysis of Dopant Diffusion and Defect Evolution during sub-millisecond Non-melt Laser Annealing based on an Atomistic Kinetic Monte Carlo Approach by Noda, T.; Vandervorst, W.; Felch, S.; Parihar, V.; Vrancken, C.; Severi, S.; Falepin, A.; Janssens, T.; Bender, H.; Van Daele, B.; Eyben, P.; Niwa, M.; Schreutelkamp, R.; Nouri, F.; Absil, P. P.; Jurczak, M.; De Meyer, K.; Biesemans, S. is a scholarly article available to read on EtoBox.

Author

Noda, T.; Vandervorst, W.; Felch, S.; Parihar, V.; Vrancken, C.; Severi, S.; Falepin, A.; Janssens, T.; Bender, H.; Van Daele, B.; Eyben, P.; Niwa, M.; Schreutelkamp, R.; Nouri, F.; Absil, P. P.; Jurczak, M.; De Meyer, K.; Biesemans, S.

Publisher

IEEE

Published

2006