Opening book details…
About this Engineering article
ILGAR technology IV:: ILGAR thin film technology extended to metal oxides by M. Bär; H.-J. Muffler; Ch.-H. Fischer; M.C. Lux-Steiner is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- M. Bär; H.-J. Muffler; Ch.-H. Fischer; M.C. Lux-Steiner
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0927-0248)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)
More by M. Bär; H.-J. Muffler; Ch.-H. Fischer; M.C. Lux-Steiner
Browse all works by M. Bär; H.-J. Muffler; Ch.-H. Fischer; M.C. Lux-Steiner