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About this Engineering article
Frequency Dependent Plasma Characteristics in a Capacitively Coupled 300 Mm Wafer Plasma Processing Chamber by Hebner, Gregory A; Barnat, Edward V; Miller, Paul A; Paterson, Alex M; Holland, John P is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hebner, Gregory A; Barnat, Edward V; Miller, Paul A; Paterson, Alex M; Holland, John P
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0963-0252)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)