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Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium - Oxidation and thermal stability of thin film copper layers by Shacham-Diamand, Y.; Li, J.; Olowlafe, J.O.; Russel, S.; Tamou, Y.; Mayer, J.W. is a scholarly article available to read on EtoBox.
- Author
- Shacham-Diamand, Y.; Li, J.; Olowlafe, J.O.; Russel, S.; Tamou, Y.; Mayer, J.W.
- Publisher
- IEEE
- Published
- 1991
- Language
- EN
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