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2007 IEEE International Interconnect Technology Conferencee - Optimizing ALD WN Process for 65nm Node CMOS Contact Application by Chen, Y.-C.; Hung, T.-Y.; Chang, Y.-L.; Shieh, K.; Hsu, C.-L.; Huang, C.; Yan, WH; Ashtiani, K.; Pisharoty, D.; Lei, W.; Chang, S.; Huang, F.; Collins, J.; Tzou, S. F. is a scholarly article available to read on EtoBox.

Author
Chen, Y.-C.; Hung, T.-Y.; Chang, Y.-L.; Shieh, K.; Hsu, C.-L.; Huang, C.; Yan, WH; Ashtiani, K.; Pisharoty, D.; Lei, W.; Chang, S.; Huang, F.; Collins, J.; Tzou, S. F.
Publisher
IEEE
Published
2007
Language
EN

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