About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Impact of water and top-coats on lithographic performance in 193-nm immersion lithography by Kishimura, Shinji; Sturtevant, John L.; Gronheid, Roel; Ercken, Monique; Maenhoudt, Mireille; Matsuo, Takahiro; Endo, Masayuki; Sasago, Masaru is a scholarly article available to read on EtoBox.

Author

Kishimura, Shinji; Sturtevant, John L.; Gronheid, Roel; Ercken, Monique; Maenhoudt, Mireille; Matsuo, Takahiro; Endo, Masayuki; Sasago, Masaru

Publisher

SPIE

Published

2005