About this scholarly article

SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Automatic photomask defect classification method by Yamashita, Kyoji; Matsuki, Kazuto; Akeno, Kiminobu; Yoshihara, Hideo is a scholarly article available to read on EtoBox.

Author

Yamashita, Kyoji; Matsuki, Kazuto; Akeno, Kiminobu; Yoshihara, Hideo

Publisher

SPIE

Published

1996