About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask by Frommhold, A.; Manyam, J.; Palmer, R. E.; Robinson, A. P. G.; Zhang, Ying is a scholarly article available to read on EtoBox.

Author

Frommhold, A.; Manyam, J.; Palmer, R. E.; Robinson, A. P. G.; Zhang, Ying

Publisher

SPIE

Published

2012