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Advanced Overlay Control in IC Manufacturing by koalatomcat is a document available to read on EtoBox.

What is Advanced Overlay Control in IC Manufacturing about?

The document presents a novel control strategy called Context-Based Wafer Grouping (CBWG) aimed at improving overlay accuracy in advanced IC manufacturing. It utilizes data science techniques to identify critical process steps affecting overlay variations and implements a group-based model for run-to-run control. The findings indicate that multi-step grouping models yield greater improvements in overlay performance compared to single-step models.

Author

koalatomcat

Language

EN