Skip to content

Opening book details…

About this Materials Science article

Effect of radio frequency power on the inductively coupled plasma etched Al0.65Ga0.35N surface by Y. Bai; J. Liu; P. Ma; B. Li; J. Zhu; L.W. Guo; X.Y. Liu is a Materials Science article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Y. Bai; J. Liu; P. Ma; B. Li; J. Zhu; L.W. Guo; X.Y. Liu
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
Published
2010
Language
EN
Field
Materials Science (Physical Sciences)

More by Y. Bai; J. Liu; P. Ma; B. Li; J. Zhu; L.W. Guo; X.Y. Liu

Browse all works by Y. Bai; J. Liu; P. Ma; B. Li; J. Zhu; L.W. Guo; X.Y. Liu