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About this Engineering article
Elaboration of nanostructured TiO2/SiO2 films by plasma enhanced chemical vapor deposition at atmospheric pressure by Gazal, Y.; Dublanche-Tixier, C.; Antoine, A.; Colas, M.; Chazelas, C.; Tristant, P. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Gazal, Y.; Dublanche-Tixier, C.; Antoine, A.; Colas, M.; Chazelas, C.; Tristant, P.
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2016
- Language
- EN
- Field
- Engineering (Physical Sciences)