About this scholarly article

SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Simulation of ion-enhanced dry-etch processes by Pelka, Joachim; Bondur, James A.; Turner, Terry R. is a scholarly article available to read on EtoBox.

Author

Pelka, Joachim; Bondur, James A.; Turner, Terry R.

Publisher

SPIE

Published

1991

Language

EN