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About this Physics and Astronomy article
Reaction-diffusion model for thermal growth of silicon nitride films on Si by de Almeida, R. M. C.; Baumvol, I. J. R. is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- de Almeida, R. M. C.; Baumvol, I. J. R.
- Publisher
- The American Physical Society; American Physical Society; Springer Verlag; American Physical Society (APS) (ISSN 1098-0121)
- Published
- 2000
- Field
- Physics and Astronomy (Physical Sciences)