About this scholarly article

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Patterning options for N7 logic: prospects and challenges for EUV by Behringer, Uwe F.W.; Finders, Jo; van Setten, Eelco; Wittebrood, Friso; Psara, Eleni; Oorschot, Dorothe; Philipsen, Vicky is a scholarly article available to read on EtoBox.

Author

Behringer, Uwe F.W.; Finders, Jo; van Setten, Eelco; Wittebrood, Friso; Psara, Eleni; Oorschot, Dorothe; Philipsen, Vicky

Publisher

SPIE

Published

2015