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About this Engineering article
Etching of Silicon Native Oxide Using Ultraslow Multicharged Ar[sup q+] Ions by Le Roux, V.; Machicoane, G.; Kerdiles, S.; Laffitte, R.; Béchu, N.; Vallier, L.; Borsoni, G.; Korwin-Pawlowski, M. L.; Roman, P.; Wu, C.-T.; Ruzyllo, J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Le Roux, V.; Machicoane, G.; Kerdiles, S.; Laffitte, R.; Béchu, N.; Vallier, L.; Borsoni, G.; Korwin-Pawlowski, M. L.; Roman, P.; Wu, C.-T.; Ruzyllo, J.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)