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About this Engineering article
The dependence of etch rate of photo-CVD silicon nitride films on NH4F content in buffered HF : V. K. Rathi, Manju Gupta and O. P. Agnihotri. Microelectronics Journal, 26, 563 (1995). is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1997
- Field
- Engineering (Physical Sciences)