About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Backside EBR process performance with various wafer properties by Goto, Tomohiro; Henderson, Clifford L.; Shigemori, Kazuhito; Vangheluwe, Rik; Erich, Daub; Sanada, Masakazu is a scholarly article available to read on EtoBox.

Author

Goto, Tomohiro; Henderson, Clifford L.; Shigemori, Kazuhito; Vangheluwe, Rik; Erich, Daub; Sanada, Masakazu

Publisher

SPIE

Published

2009