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About this Engineering article

Influence of plasma exposure in the preparation of A1N films by facing-target sputtering by Kikuo Tominaga; Hiroshi Imai; Yasuhiko Sueyoshi is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Kikuo Tominaga; Hiroshi Imai; Yasuhiko Sueyoshi
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
Published
1993
Language
EN
Field
Engineering (Physical Sciences)