About this scholarly article

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Edge roughness evaluation method for quantifying at-size beam blur in electron-beam lithography by Yoshizawa, Masaki; Moriya, Shigeru; Dobisz, Elizabeth A. is a scholarly article available to read on EtoBox.

Author

Yoshizawa, Masaki; Moriya, Shigeru; Dobisz, Elizabeth A.

Publisher

SPIE

Published

2000