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About this Engineering article
Improvement of the adhesion of c-BN films by bias-graded h-BN interlayers by R Freudenstein; W Kulisch is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- R Freudenstein; W Kulisch
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2002
- Field
- Engineering (Physical Sciences)