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About this Engineering article
Electroosmotic Flow in Vapor Deposited Silicon Dioxide and Nitride Microchannels by Hamblin, Mark N.; Edwards, John M.; Lee, Milton L.; Woolley, Adam T.; Hawkins, Aaron R. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hamblin, Mark N.; Edwards, John M.; Lee, Milton L.; Woolley, Adam T.; Hawkins, Aaron R.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 1932-1058)
- Published
- 2007
- Language
- EN
- Field
- Engineering (Physical Sciences)