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Electroosmotic Flow in Vapor Deposited Silicon Dioxide and Nitride Microchannels by Hamblin, Mark N.; Edwards, John M.; Lee, Milton L.; Woolley, Adam T.; Hawkins, Aaron R. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Hamblin, Mark N.; Edwards, John M.; Lee, Milton L.; Woolley, Adam T.; Hawkins, Aaron R.
Publisher
American Institute of Physics; AIP Publishing (ISSN 1932-1058)
Published
2007
Language
EN
Field
Engineering (Physical Sciences)

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