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About this Materials Science article
Atomic Layer Deposition of HfO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperatures by Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Song, Fuquan; Williams, Paul; Heys, Peter N.; Odedra, Rajesh is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Song, Fuquan; Williams, Paul; Heys, Peter N.; Odedra, Rajesh
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 0897-4756)
- Published
- 2007
- Field
- Materials Science (Physical Sciences)