About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Understanding the ion beam in EUV mask blank production by Kearney, Patrick; Naulleau, Patrick P.; Wood II, Obert R.; Jindal, Vibhu; Weaver, Alfred; Teora, Pat; Sporre, John; Ruzic, David; Goodwin, Frank is a scholarly article available to read on EtoBox.

Author

Kearney, Patrick; Naulleau, Patrick P.; Wood II, Obert R.; Jindal, Vibhu; Weaver, Alfred; Teora, Pat; Sporre, John; Ruzic, David; Goodwin, Frank

Publisher

SPIE

Published

2012