About this scholarly article

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Study of laser thermal processing (LTP) to meet sub 130 nm node shallow junction requirements by Talwar, S.; Felch, S.; Downey, D.; Yun Wang, is a scholarly article available to read on EtoBox.

Author

Talwar, S.; Felch, S.; Downey, D.; Yun Wang,

Publisher

IEEE

Published

2000

Language

EN