About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Design for Manufacturability through Design-Process Integration VII - Triple patterning lithography (TPL) layout decomposition using end-cutting by Yu, Bei; Gao, Jhih-Rong; Pan, David Z.; Mason, Mark E.; Sturtevant, John L. is a scholarly article available to read on EtoBox.

Author

Yu, Bei; Gao, Jhih-Rong; Pan, David Z.; Mason, Mark E.; Sturtevant, John L.

Publisher

SPIE

Published

2013