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Growth of Cu thin films by the successive ionic layer adsorption and reaction (SILAR) method by S. Lindroos; T. Ruuskanen; M. Ritala; M. Leskelä is a Engineering article available to read on EtoBox.

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Copper thin films were grown on reduced indium tin oxide, molybdenum and polymer substrates using successive ionic layer adsorption and reaction (SILAR) method. Copper films were grown sequentially in a controlled way using simple copper salt and basic solution of formaldehyde as precursors. The copper films were polycrystalline with no preferred orientation as characterised by X-ray diffraction. On all substrates, the growth was clearly island growth in the beginning but after the whole surface was covered, the growth was more homogeneous.

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Author

S. Lindroos; T. Ruuskanen; M. Ritala; M. Leskelä

Publisher

Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)

Published

2004

Language

EN

Field

Engineering (Physical Sciences)